Feasibility of RF Sputtering and PIIID for production of thin films from red mud

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dc.contributor.authorAntunes, Maria Lúcia Pereira
dc.contributor.authorCruz, Nilson Cristino Da
dc.contributor.authorDelgado, Adriana De Oliveira
dc.contributor.authorDurrant, Steven Frederick
dc.contributor.authorBortoleto, José Roberto Ribeiro
dc.contributor.authorLima, Vivian Faria
dc.contributor.authorSantana, Pericles Lopes
dc.contributor.authorCaseli, Luciano [UNIFESP]
dc.contributor.authorRangel, Elidiane Cipriano
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)
dc.contributor.institutionUniversidade Federal de São Carlos
dc.contributor.institutionUniversidade Federal de São Paulo (UNIFESP)
dc.date.accessioned2015-06-14T13:47:18Z
dc.date.available2015-06-14T13:47:18Z
dc.date.issued2014-10-01
dc.description.abstractDuring the extraction of aluminum from bauxite, a waste of oxides containing traces of heavy metals in a highly alkaline matrix, called Red Mud (RM), is produced. In this study RM is characterized and the feasibility of using it as a precursor for the production of thin films by Plasma Sputtering and by Plasma Immersion Ion Implantation and Deposition (PIIID) is demonstrated. The chemical structure and composition, surface morphology, topography, and wettability of the films prepared using such methodologies were investigated. The films consist mainly of the elements aluminum, silicon, iron and carbon. Infrared spectroscopic analyses reveal the presence of C=O, C-H2, Fe(OH), Al-O and Si-C functionalities. RF Sputtering produced films with smoother surfaces, whereas PIIID produced granular surface structures. Surface contact angle measurements showed that despite the presence of oxides and hydroxides, the films are hydrophobic, thus exhibiting an interesting link between the physical and thermodynamical properties.en
dc.description.affiliationUniversidade Estadual Paulista
dc.description.affiliationUniversidade Federal de São Carlos
dc.description.affiliationUniversidade Federal de São Paulo (UNIFESP)
dc.description.affiliationUnifespUNIFESP
dc.description.sourceSciELO
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.format.extent1316-1323
dc.identifierhttp://dx.doi.org/10.1590/1516-1439.290714
dc.identifier.citationMaterials Research. ABM, ABC, ABPol, v. 17, n. 5, p. 1316-1323, 2014.
dc.identifier.doi10.1590/1516-1439.290714
dc.identifier.fileS1516-14392014000500026.pdf
dc.identifier.issn1516-1439
dc.identifier.scieloS1516-14392014000500026
dc.identifier.urihttp://repositorio.unifesp.br/handle/11600/8602
dc.language.isoeng
dc.publisherABM, ABC, ABPol
dc.relation.ispartofMaterials Research
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectred muden
dc.subjectthin filmsen
dc.subjectplasma sputteringen
dc.subjectPIIIDen
dc.titleFeasibility of RF Sputtering and PIIID for production of thin films from red muden
dc.typeinfo:eu-repo/semantics/article
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