The Influence of the Electrodeposition Conditions on the Electroanalytical Performance of the Bismuth Film Electrode for Lead Determination

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dc.contributor.authorNunes, Luiza M. S. [UNIFESP]
dc.contributor.authorFaria, Ronaldo C. [UNIFESP]
dc.contributor.institutionUniversidade Federal de São Paulo (UNIFESP)
dc.date.accessioned2016-01-24T13:51:43Z
dc.date.available2016-01-24T13:51:43Z
dc.date.issued2008-10-01
dc.description.abstractThe bismuth film is a great promise as a suitable material to replace the mercury electrodes due to its low toxicity and good cathodic potential range. This work studies the influence of the electrodeposition conditions in the morphology and electroanalytical performance of the bismuth film electrodeposited onto copper electrode. the bismuth films were obtained in nitric or hydrochloric acid solutions with and without the presence of sodium citrate. the films were characterized by field emission scanning electron microscopy (FE-SEM) and scanning electron microscopy with energy dispersive X-ray spectrometry (SEM-EDX). the microscopic analysis of the bismuth film obtained in HCl solution with sodium citrate (BIFE-Cit) showed more homogeneous structure with higher content of bismuth than the film obtained in HCl only (BiFE-HCl). the BiFE-Cit exhibited a better analytical performance for lead with good adherence to the copper substrate.en
dc.description.affiliationUniversidade Federal de São Paulo, Dept Quim, Ctr Ciencias Exatas & Tecnol, BR-13565905 São Paulo, Brazil
dc.description.affiliationUnifespUniversidade Federal de São Paulo, Dept Quim, Ctr Ciencias Exatas & Tecnol, BR-13565905 São Paulo, Brazil
dc.description.sourceWeb of Science
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.description.sponsorshipIDFAPESP: 05/02998-5
dc.format.extent2259-2263
dc.identifierhttp://dx.doi.org/10.1002/elan.200804293
dc.identifier.citationElectroanalysis. Weinheim: Wiley-v C H Verlag Gmbh, v. 20, n. 20, p. 2259-2263, 2008.
dc.identifier.doi10.1002/elan.200804293
dc.identifier.issn1040-0397
dc.identifier.urihttp://repositorio.unifesp.br/handle/11600/30929
dc.identifier.wosWOS:000260693300015
dc.language.isoeng
dc.publisherWiley-Blackwell
dc.relation.ispartofElectroanalysis
dc.rightsinfo:eu-repo/semantics/restrictedAccess
dc.rights.licensehttp://olabout.wiley.com/WileyCDA/Section/id-406071.html
dc.subjectBismuth film electrodeen
dc.subjectStripping voltammetryen
dc.subjectTrace analysisen
dc.subjectElectrodepositionen
dc.titleThe Influence of the Electrodeposition Conditions on the Electroanalytical Performance of the Bismuth Film Electrode for Lead Determinationen
dc.typeinfo:eu-repo/semantics/article
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