Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control

Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control

Author Duarte, D. A. Google Scholar
Massi, M. Autor UNIFESP Google Scholar
Sagas, J. C. Google Scholar
Silva Sobrinho, A. S. da Google Scholar
Irala, D. R. Google Scholar
Fontana, L. C. Google Scholar
Institution Technol Inst Aeronaut
Universidade Federal de São Paulo (UNIFESP)
Santa Catarina State Univ
Catholic Santa Catarina
Abstract This paper investigates the effect of the reactive gas mixture (N-2 + O-2 + Ar) and oxidation of the nitride layers on the system stability during the reactive sputter deposition of TiOxNy thin films. the present research is an extension of previous investigations conducted by Severin et al. (Appl. Phys. Lett., 88 (2006) 161504) and Duarte et al. (Appl. Surf. Sci., 269 (2013) 55-59) in which the Berg's model was used. to study reactive deposition of oxynitrides. the results show that the addition of N-2 to the process avoids the formation of a hysteresis loop and facilitates the deposition of films with fractions of TiO2 at any value. These achievements are not possible without this procedure. in contrast, despite eliminating plasma instabilities, the addition of N-2 decreases the mass deposition rate due to the modifications in the sputtering yield. Other results show that the oxidation of TiN also plays a key role in the mass deposition rate and in the hysteresis loop. (C) 2013 Elsevier B.V. All rights reserved.
Keywords Reactive deposition
Berg's model
Hysteresis
TiOxNy
TiO2
Language English
Sponsor Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
PRONEX
Grant number PRONEX: 11/50773-0
Date 2014-03-01
Published in Vacuum. Oxford: Pergamon-Elsevier B.V., v. 101, p. 200-204, 2014.
ISSN 0042-207X (Sherpa/Romeo, impact factor)
Publisher Elsevier B.V.
Extent 200-204
Origin http://dx.doi.org/10.1016/j.vacuum.2013.08.014
Access rights Closed access
Type Article
Web of Science ID WOS:000330143000037
URI http://repositorio.unifesp.br/handle/11600/37502

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