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Title: New evidence in support of staging approaches in schizophrenia: Differences in clinical profiles between first episode, early stage, and late stage
Authors: Ortiz, Bruno Bertolucci [UNIFESP]
Eden, Fernando Dal Medico
Rodrigues de Souza, Aline Silva
Teciano, Carla Agostinho
de Lima, Daniela Malatesta
Noto, Cristiano [UNIFESP]
Higuchi, Cinthia Hiroko [UNIFESP]
Cogo-Moreira, Hugo [UNIFESP]
Bressan, Rodrigo Affonseca [UNIFESP]
Gadelha, Ary [UNIFESP]
Issue Date: 2017
Publisher: W B Saunders Co-Elsevier Inc
Citation: Comprehensive Psychiatry. Philadelphia, v. 73, p. 93-96, 2017.
Abstract: Few studies have examined the progression of symptom dimensions in schizophrenia patients over the course of the illness. The objective of this study was to investigate whether clinical and psychopathological differences exist between first-episode schizophrenia (FES) and multiple-episode patients in an inpatient setting. Patients (N = 203) were evaluated using the Positive and Negative Syndrome Scale (PANSS) overtime. Five different generalized estimating equations were built for the PANSS factors using the following as covariates: sex, patient's age, assessment time point (i.e., moment of patient's evaluation, with a minimum of two and a maximum of four assessments throughout the study timeframe). The FES group was used as the reference to which the groups with up to five years of illness and more than five years of illness were compared. Remission rates and treatment resistance (TRS) rates were also compared. Generalized estimating equations were used to allow for different numbers of assessments over the study period. Patients with FES showed significantly milder severity in positive, disorganized, and hostility factors. Also, FES patients were more likely to achieve remission (P = 0.002) and had lower rates of TRS (P = 0.001). First-episode schizophrenia seems to be the critical period to improve outcome, as multiple-episode patients were similar in clinical characteristics regardless of illness duration. (C) 2016 Elsevier Inc. All rights reserved.
ISSN: 0010-440X
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