Please use this identifier to cite or link to this item: https://repositorio.unifesp.br/handle/11600/35514
Title: Photo-Fenton oxidation of phenol and organochlorides (2,4-DCP and 2,4-D) in aqueous alkaline medium with high chloride concentration
Authors: Luna, Airton J.
Chiavone-Filho, Osvaldo
Machulek, Amilcar
Moraes, Jose Ermirio F. de [UNIFESP]
Nascimento, Claudio A. O.
Natl Inst Ind Property
Univ Fed Rio Grande do Norte
Universidade Federal de Mato Grosso do Sul (UFMS)
Universidade Federal de São Paulo (UNIFESP)
Universidade de São Paulo (USP)
Keywords: Photo-Fenton
Pesticides
Sodium chloride
Issue Date: 30-Nov-2012
Publisher: Elsevier B.V.
Citation: Journal of Environmental Management. London: Academic Press Ltd- Elsevier B.V., v. 111, p. 10-17, 2012.
Abstract: A highly concentrated aqueous saline-containing solution of phenol, 2,4-dichlorophenoxyacetic acid (2,4-D) and 2,4-dichlorophenol (2.4-DCP) was treated by the photo-Fenton process in a system composed of an annular reactor with a quartz immersion well and a medium-pressure mercury lamp (450 W). the study was conducted under special conditions to minimize the costs of acidification and neutralization, which are usual steps in this type of process. Photochemical reactions were carried out to investigate the influence of some process variables such as the initial concentration of Fe2+ ([Fe2+](0)) from 1.0 up to 2.5 mM, the rate in mmol of H2O2 fed into the system (F-H2O2,F-in) from 3.67 up to 7.33 mmol of H2O2/min during 120 min of reaction time, and the initial pH (pH(0)) from 3.0 up to 9.0 in the presence and absence of NaCl (60.0 g/L). Although the optimum pH for the photo-Fenton process is about 3.0, this particular system performed well in experimental conditions starting at alkaline and neutral pH. the results obtained here are promising for industrial applications, particularly in view of the high concentration of chloride, a known hydroxyl radical scavenger and the main oxidant present in photo-Fenton processes. (C) 2012 Elsevier B.V. All rights reserved.
URI: http://repositorio.unifesp.br/handle/11600/35514
ISSN: 0301-4797
Other Identifiers: http://dx.doi.org/10.1016/j.jenvman.2012.06.014
Appears in Collections:Em verificação - Geral

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